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substrate bias.
The peak substrate bias was -100 V.
Different values of substrate bias are employed.
substrate bias was set to − 100 V.
Two deposition parameters (substrate temperature and substrate bias) were varied.
This energy is controlled by the substrate bias voltage.
The substrate bias was selected as the controlling parameter ranging from floating to −300 V.
The negative substrate bias (Vs) ranged from 0 V to −100 V.
The optimum condition of the negative substrate bias was close to 50 V.
No substrate bias was used and the substrate temperature was kept constant below 200 °C.
The effects of substrate bias (Vs) on film structure and mechanical properties are studied.
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