Exact(2)
In the previous subsections, we discussed the resultant kurtosis after SS and DS.
In the previous subsections, we discussed the accuracy of the derived expressions and compared them to the expressions in ([14]], Eq. 20) and ([15]], Eq. 12) that require summation and integration terms to get the needed accuracy.
Similar(58)
In the following subsections, we discuss the aforementioned results.
In the following two subsections, we discuss the results on non-instrumented (baseline) and instrumented estimations.
In the following two subsections, we discuss the role of two basic processes in two different topics.
In the following subsections, we discuss the relationship between focal mechanisms, stress regime, and heterogeneous structure in detail.
In the subsequent subsections, we discuss the details of the patterns starting with the patterns for determining directions on Si{100} followed by Si{110} wafers.
In the following subsections, we discuss the CRLB for two cases, i.e. for known θ k and for unknown θ k respectively.
In the next subsections, we discuss the answers to the two research questions presented in Section 5 and present the main proposed solutions regarding the design issues (Figure 4).
In the below subsections, we discuss the physical meaning of long-term variation in the Sq amplitude obtained by the present analysis of a large amount of geomagnetic field data.
In the following subsections, we discuss the principles underlying our approach and how these give rise to the performance gains observed and then compare our results with those from other studies.
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