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H-terminated surfaces are of importance since they are considered as the starting surfaces for further functionalization of Si NWs [11 15].
Since these dislocations are directly related to the quality of the AlN on sapphire growth, these may be avoidable by using thicker AlN templates as starting surfaces.
In the current work, we study the oxidation kinetics of hydrogen-terminated Si NWs (H-Si NWs) as the starting surfaces for molecular functionalization of Si surfaces.
While on the non-coated starting surfaces no silicon-containing species were detected, the XPS results reveal effective thicknesses of release agent in a range between approximately one nanometer and several nanometers.
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The gun geometry is optimized using the Electron Trajectory Program EGUN at higher scaling factors by choosing the closest converging starting surface.
The hydroxyl-terminated surface is similar to the starting surface, so the ALD process can by cycled to achieve the desired film thickness.
The ending hydroxyl-terminated surface is similar to the starting surface, allowing the process to be cycled to grow the desired film thickness.
The hydroxyl-terminated starting surface is exposed to a metal organic precursor that reacts with the surface in a self-limiting reaction.
Next, a 15-nm-thick Si layer was grown at 520 °C (sample A), 550 °C (sample B), and 580 °C (sample C), respectively, to obtain a flat starting surface.
Hydrogen termination can also be used as a starting surface for grafting of more complex organic molecules on diamond [10, 18 20].
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