Sentence examples for stack sampling from inspiring English sources

Besides stack sampling that is used to monitor dust emission status, simulation can be a more simple way and an alternative to estimate the emission.

The chlorine flow in the incinerator was also investigated via stack sampling and the analysis of the composition of the residual.

To assess the environmental risk of this technique, standardized stack sampling and analytical methods are needed.

We collected dust samples using a specialized vacuum, the high-volume small-surface sampler (HVS3; Cascade Stack Sampling System, Venice, FL), from December 2001 through March 2006.

As described previously [ 14, 18], from October 2001 to June 2006, we collected residential dust samples using a high volume small surface sampler (HVS3) (Cascade Stack Sampling Systems, Bend, OR).

Images were obtained using confocal fluorescence microscopy using step-wise 1  μM z-stack sampling.

Image stacks (sampled at Nyquist resolution in XY and Z) were deconvolved using the ImageJ Iterative Deconvolve 3D plugin with theoretically calculated point spread function, created with the ImageJ Diffraction PSF CD plugin.

The a-Si H i /Al2O3 a-Si H i /Al2O3the stackturesamplesmples are shown in thele 1) have been annealed at 450°C for 10 min in air.

Residues value can be used to characterize the inductive and the capacitive elements of the electrical equivalent implementation, while resistance value is determined by comparison with experimental data obtained on piezo stack sample.

Fig. 1 Schematic structures of multilayer La2O3/Al2O3 stack samples S1 and S2 and LaAlO3 sample S3 Table 1 The structures and annealing temperatures of samples S1 S3 Sample Film structures Annealing temperature S1 2 × (20-cycle Al2O3 + 20-cycle La2O3 °C00 °C S2 2 × (20-cycle Al2O3 + 20-cycle La2O3 °C00 °C S3 40 × (1-cycle Al2O3 + 1-cycle La2O3 °C00 °C.

The samples after deposition were annealed at 450°C for 10 min in air. Figure 6 shows that the effective minority carrier lifetimes of the a-Si H i /Al2O3 a-Si H i /Al2O3ncreastack a factor of three (from about 10 μsamplesout 30 μs) compared wincrease a-Si film passivation samples.