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Soft baking at 110°C for 1 min was followed in order to remove the residual solvent.
Later, a soft baking was performed in order to remove most of the solvent from the resist coating, making it photosensitive.
Robust Teflon-coated surfaces were fabricated via a spin coating procedure and a soft baking procedure at 90 °C for 10 min. This type of treated surface is called a 'Teflon-coated nano/microstructured surface' in this paper.
As shown in Figure 16, this approach intentionally utilizes significant under soft baking so it allows photoresist retains good amount of solvent which in turn greatly increases the dissolution rate of the photoresist during the developing process.
This step is followed by soft baking for 5 min at 100°C and then rapid thermal processing (RTP) annealing for 1 min in an O2 environment at various annealing temperatures ranging from 450°C to 700°C.
Subsequently, a layer of positive photoresist (AZ 6632, MicroChemicals GmbH, Ulm, Germany) was spun onto the ProLIFT-covered porous film at 6,000 rpm for 40 s, followed by soft baking at 110°C for 1 min. The photoresist was exposed with the grating mask using a standard UV mask aligner and developed using dilute AZ 400K (MicroChemicals) developer.
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Following pre-baking at 65°C for 10min, a soft bake was performed for 20 min at 95°C.
(If the pieces are still soft, continue baking them until they feel hard).
"Glenda and Elton," purred the soft, cookie-baking-crimp-the-edges-of-your-pastry voice of Martha Stewart.
They'll set harder as they cool, so don't worry if they're soft just after baking.
You then position yourself half in and half out of the water, with your top half fanned by balmy tropical breezes, your bottom half lapped by warm tropical waves and all of you in contact with soft sand and baking sunshine; the beach is about the only place on earth you can experience earth, wind, water and fire all at the same time and not be permanently damaged by any of them.
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