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It can be observed that both DNA and Ni-DNA show semiconductor properties.
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The resistivity of the film deposited at Dts=45 mm from a 4 wt.% Al(OH 3-doped ZnOH 3-dopedas approximately 9.8×10−2 Ω cm, showing semiconductor properties.
Tungsten-substituted molybdenum disulfide (Mo1 − xWxS2) shows excellent semiconductor properties related to the adjustable band gap structure.
The resistivity of the film deposited under Dts of 45 mm with 4 wt.% Al(OH 3 doped ZnO in target was approximately 9.8×10−2 Ω cm, showing a semiconductor property.
All the doped structures show n-type semiconductor properties due to diffuse excess electrons in the system which give rise to new HOMO.
The room temperature electrical conductivity showed metal and semiconductor properties on the as-sprayed and annealed coatings.
Due to the fluorine substitution of hexafluorocylopentene at the molecular center and the hole-transport characteristics of the triphenylamine moiety on the periphery, our chromophores showed obvious dual semiconductor properties, i.e., n- and p-type, which demonstrated a potential application for OPV devices.
Interestingly, we find that the PBE + U band structure of Ti-doped blue phosphorene shows a magnetic semiconductor property with a gap opening (see Fig. 6), different from the half-metallic character predicted by PBE.
Studies of metal dissolution processes showed that Cu deposits cannot be removed anodically from TiO2-surfaces reflecting the semiconductor properties of TiO2.
The measurements show that bilayer graphene intrinsic semiconductor property and the introduction of a perpendicular magnetic field could induce high resistance.
Although semiconductors show the scattering properties of both dielectrics and metals, it was not possible to combine the two effects constructively.
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