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The electrical resistivity of thin films can be found from the equation ρ = m n e 2 τ avg, where τ avg is the average scatter time and is related to the mean free path by equation l = v F *τ avg, where v F is the Fermi velocity.
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The cross-over between the two regimes occurs at times comparable to the scattering time.
The energy from a femtosecond laser pulse is deposited into a target faster than the electron-phonon scattering time.
For the low temperature limit, the scattering time averaged over energy can be written as 〈τ〉 ≈ τ(E F ) [21].
These expressions are valid for any impurity concentration described in Equations (56) to (60) by scattering time.
In addition, while the hole scattering time and hole drift mobility increased with increasing Mg layer thickness, the free holes concentration and hole bounded plasmon frequency significantly decreased.
The crucial material parameters for device performance are the charge carrier density, controlled by the Fermi energy, and the Drude scattering time.
The appearance of ultrafast dynamics is mainly determined by the position of probed level with respect to static Fermi energy and/or momentum scattering time.
Based on the presented model, a new tailoring method has presented to adjust the electron phonon scattering time in intersubband-transition-based structures while keeping the electronic properties unaltered.
The modeling of the dielectric spectra allowed determining the effect of the Al, Yb and Au thin layers on the electron scattering time, the plasmon frequency, free electron density and drift mobility.
As a result of the parabolic band structure of bilayer graphene, the energy averaging of the Coulomb scattering time can give rise to the resistivity decreasing proportionally to temperature: ρ bilayer ∝ (k B T)− 1.
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