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Sub-20 nm patterns have been fabricated by using oxidation scanning probe lithography on epitaxial graphene.
A graphene cellular array on an insulating SiO2 layer was fabricated by scanning probe lithography.
Oxidation Scanning Probe Lithography (o-SPL) is an established method employed for device patterning at the nanometer scale.
This work represents our initial effort towards the fabrication of complex nanopatterns with automated scanning probe lithography (SPL).
This is also valid for field emission based scanning probe lithography FE-SPL), wherein low-energetic electrons (< 100 eV) are applied for direct exposure of ultra-thin resist films (< 20 nm).
The defects created by scanning probe lithography (SPL) under ambient conditions in CVD grown graphene were investigated using atomic force microscopy, micro-Raman (μ-RS) and micro-X-ray photoelectron spectroscopy (μ-XPS).
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"This advance has a good chance of transitioning scanning-probe lithography from academic [use] to being an important production and prototyping tool broadly used across the semiconductor and biotechnology industries," says Joseph DeSimone, professor of chemistry at the University of North Carolina at Chapel Hill.
"Fabrication of Stimulus-Responsive Nanopatterned Polymer Brushes by Scanning-Probe Lithography". Nano Letters 4, no. 2 (2004): 373-376.
Therefore, series (and often expensive) nanofabrication processes using equipment such as electron-beam lithography and scanning-probe lithography should be avoided.
In order to form micro- to nano-sized patterns, various lithographic technologies have been used, such as DUV photolithography [1], e-beam lithography [2, 3], X-ray lithography [4, 5], laser holographic lithography [6], nanosphere lithography [7], scanning probe microscopy lithography [8], and so on.
Relatively few approaches are viable for hierarchical 2D patterning of biomolecules, including BCP micelle lithography coupled with photo- or electron-beam lithography, scanning probe BCP lithography, and other specialized microfabrication techniques, which all exhibit similar aforementioned limitations.
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