Sentence examples for respective deposition from inspiring English sources
The variation of the coating rates at different deposition stages corresponds to the deposition mechanism of their respective deposition stage.
The material fluxes and energy consumption for each process step of the respective deposition processes were monitored and are illustrated by individual Sankey diagrams.
We measured improvements in the EQE of a thin Si solar cell resulting from the respective deposition of metallic nanoparticles on the front and rear surfaces at wavelengths of between 300 and 1,200 nm.
Simultaneous deposition of Si and Ta from opposite sides on a stationary substrate yields nanorods consisting of laterally separated Si and Ta components, since atomic shadowing causes deposition only onto the sphere-sides that are exposed to the respective deposition fluxes.
After development of a sputter process for the compound targets by optimization of cathode power and nitrogen partial pressure, this process was compared to the commercially applied mosaic target process by taking into account the sputter yields of Ti and Al and the respective deposition rates.
Brown, Spiegel, and Murphy had their respective depositions for the trial on April 5, 8, and 9.
The difference in lengths found between core segments with different Co/Ni ratio can be attributed to deviations of their respective effective deposition rates from that shown in Figure 3.
We estimate that the respective Fg deposition conditions lead to the protein surface density of 1.6, 1.2, and 1.8 mg/m on PS, PMMA, and PS- b-PMMA, respectively.
A model hierarchy for nonwoven manufacturing in the spunbond process was presented in [3], we adapt and transfer the ideas for the handling of the endless fibers in the respective entanglement and deposition regimes to the staple fibers in the airlay process at hand.
If the process is rate-controlled, the selectivity constants represent the ratios of the respective rate constants of deposition.
The overall chemical composition was controlled by the position of the respective sample in the deposition chamber and ranged from x = [Al]/([Ti] + [Al]) = 0.06 to 0.64.
