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The mask can be fabricated with required aspect ratio (from 3 up to 100), fine pore shape, surface flatness, and mechanical hardness.
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This can give the film the required robustness for use as either a standalone membrane in case of, e.g., battery separator [23] or lithographic etching mask [18, 29], or the required high aspect ratio (a.r. = h/d, where d is the pore diameter) when using the layer as a template for, e.g., nanowire electrodeposition (where a.r. ≥ 1,000 can be required [21, 30]).
These nanoporous hard etch masks can be applied to the nanopatterning processes that require high aspect ratio structures.
The dynamic soaring utilized by living Procellariiformes requires high aspect ratio, high efficiency wings and a high wing loading to promote rapid glide speed [65].
Small pores require higher aspect ratios than large pores to obtain the same permeate production rate.
High-definition connections require a 16:9 aspect ratio.
Powders with a high volume fraction of inclusions, small relative inclusion size, and/or large inclusion aspect ratio required the greatest pressures to densify.
The high aspect ratio, required for architectural integration, and the use of self aligning aerodynamic appendages distance this Savonius assembly from all the other ones tested in previous research works.
The maximum aspect ratio required for 95% alignment was 0.16.
In the combination, the aspect ratio is required to be less than 1.35 to achieve local TBR of 1.35.
Representatively, carbon nanotube (CNT) and carbon nanofiber (CNF) are attractive for use in a variety of nanomaterials for which a high aspect ratio is required.
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