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One plug was removed, dipped in embedding medium (Tissue Tek) and snap-frozen on dry ice.
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When a small chunk has had all its splinter sections removed, dip it in the glittering gold nail paint and draw a backwards S lightning bolt.
Plates were incubated for 48 h as described above before the coverslips were removed, dip washed in (phosphate buffered saline PBS and added to new 24-well plates containing fresh medium and bacteria [30].
After 6 h and 24 h of incubation in an anaerobic atmosphere at 37°C, the slides were removed, shortly dipped into 0.9% sodium chloride solution to remove non adherent bacteria and then placed into other tubes containing 0.9% sodium chloride solution.
The shell is removed by dipping the nut in hot water.
Before AlN deposition, the surface native oxide was removed by dipping the samples in HCl:H2O (1:10) for 60 s.
The phosphosilicate glass (PSG) that formed during diffusion was removed by dipping the samples in 5% HF for 2 min.
The excess ether on the fibre surface was removed by dipping it in an ultrasonic bath for 2 to 3 s.
Finally, the PR filled into the space between nanorods as well as remained on the substrate was removed by dipping into acetone.
The wafer is doped with phosphorous in a furnace using a conventional POCl3 diffusion source at 830°C for 7 min. Phosphorus silicate glass [PSG] is removed by dipping the wafer in 10% hydrofluoric acid [HF] solution for 30 s.
All textured p-type silicon wafers are then doped with phosphorus in a furnace using a conventional POCl3 diffusion source first at 830°C for 7 min. PSG is removed by dipping the wafer in 10% HF solution for 30 s.
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CEO of Professional Science Editing for Scientists @ prosciediting.com