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Therefore, a buffer layer growth is required to remove the defects produced by the patterning process.
Therefore, significant effort has been invested to develop processes for CNTs to remove the defects created during the synthesis stage.
Recently, a process to remove the defects in SWCNTs without increasing the diameter and wall number was developed by applying electrical current in conjunction with heating (heat and current) to an "aligned SWCNT sheet".
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The reason was due to the dual effect of high pressure on increasing the nucleation rate and removing the defects.
In the synthetic process, cetyltrimethylammonium bromide plays a crucial role in controlling the morphology, and introducing a phase transition as well as effectively removing the defect states.
In addition, the Na removed the defect states in the CIGS thin-films, and therefore many acceptor and donor states, as well as defects, around the GB could be altered.
Proper design can remove the design defects of the cooperative manipulators and can be utilized in a more efficient way.
A two-step buffer Si growth procedure was employed to remove the processing defects and residual surface contamination.
The X-ray diffraction and Raman analysis reveal that annealing improves the crystallinity and also help to remove the structural defects in ZnCo2O4.
A subsequent annealing at 610 °C for 10 min was used to remove the intrinsic defects and flattening the surface [18, 24 26] before deposition of the second QD layer.
Unfortunately the VMC instrument could not acquire good "in-orbit" additional flat fields to remove the image defects (Titov et al. 2012) during this period, so a comparison of VMC and MESSENGER concurrent images is not useful.
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