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The parameters in order to remove Cu gettering at RP/2 are determined for the additional Si+ implantation.
The present study revealed that both L. minor L. and L. gibba L. had very high potential to remove Cu, Pb, Zn, and As in gallery water contaminated by different ores.
It has previously been shown that it is possible to remove Cu, Cr and As from CCA-treated wood using electrodialytic remediation in laboratory scale, but until now, the method had not been studied in large scale.
A conventional PVD Cu seed layer is etched to remove Cu from the sidewalls and free surface while leaving a continuous Cu wetting layer intact on the trench bottom.
To study the equilibrium concentration in the adsorption process using CA2 as the adsorbent to remove Cu (II) of aqueous solution, the adsorption assays were performed in duplicate.
It is necessary to reduce the silicon stress through suitable pre-annealing after the TSV electroplating process, and then, CMP is used to remove Cu overburden and linearize the TSV.
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This indicates that HA can be considered as promising material for removing Cu and Zn from aqueous solution.
FeCl3 or (NH4 2S2O8 are often used for removing Cu, and NaOH or KOH for sapphire [79, 80].
The results indicated that the HA used in this work proved to be effective material for removing Cu and Zn from aqueous solutions.
From the results obtained, it can be concluded that both photocatalytic kaolinite clay adsorbents are capable of removing Cu (II) and Co (II) ions from relatively high concentrated aqueous solutions.
The results and the parameters obtained indicated conclusively that photocatalytically modified diatomaceous ceramic adsorbents are capable of removing Cu (II) and Co (II) ions from relatively high concentrated aqueous solutions.
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