Sentence examples for rapid thermal processing from inspiring English sources
A SiO2 layer, which was deposited on bulk silicon substrate using plasma-enhanced chemical vapor deposition (PECVD) followed by a 50-nm-thick α-Si thermally grown by rapid thermal processing (RTP).
In this work, buried nanocrystals of the direct band gap II VI compound semiconductor CdSe were synthesized by sequential high dose ion beam implantation into thin thermally grown silicon dioxide layers and subsequent rapid thermal processing.
First, SiO2 film was deposited over the bulk silicon substrate using plasma-enhanced chemical vapor deposition (PECVD) followed by α-Si material thermally grown over the SiO2 layer using a rapid thermal processing (RTP) tool.
The rotating cone reactor is a novel reactor type for rapid thermal processing of solids.
Single wafer rapid thermal processing (RTP) is widely used in semiconductor manufacturing.
As an example, the ETFE of a Rapid Thermal Processing (RTP) reactor simulation is constructed.
Figure 1 shows the Ag spherical nanoparticles on silicon surface produced by rapid thermal processing-induced stress.
The rotating cone reactor is a novel reactor type which can be used for rapid thermal solids processing.
The results are compared with a recently introduced gate control processing: the local rapid thermal oxidation process of the AlGaN layer.
After the laser structuring, the samples have been implanted by boron element using Plasma Immersion Technique (PULSION tool, developed by IBS) to form a p-n junction, followed by rapid thermal annealing (RTA) processing.
