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Unlike the co-electrodeposition of copper-zinc-tin, the electrodeposition of stacked metal layers allows precise control of the quantity deposited and is effective under a large range of deposition conditions of temperature, pH, and concentration of the main salt or addition agent.
Thin solid films of zirconia were deposited on solid and porous substrates over a range of deposition conditions by the pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD) process.
This indicates that the range of deposition temperature fits for the deposition of Al2O3 films.
For examining a wide range of deposition parameters, we use a design-of-experiments approach.
A final overall observation from the vacuum study was that as vacuum rate was increased, the overall dose range of deposition decreased (Figure 4A).
Secondly, under a wide range of deposition conditions, a bimodal distribution of islands (shallow {105} pyramids and steeper, multifaceted domes [4, 5]) is obtained.
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Nanotwinned ultrafine grained Ag thick films with different twin densities and orientations have been synthesized by magnetron sputtering with a wide-range of deposition rates.
As a result, the interception capacity and ranges of deposition in each corresponding region do not change with the fence inclinations.
The decrement of u*+ at the same place close to the fence increases with the fence height, and the same is true for the ranges of deposition.
Zirconia (ZrO2) thin films were deposited by LI MOCVD technique using the precursor Zr(thd 4 over large ranges of deposition parameters.
Wide ranges of deposition temperature from 200 to 850 °C as well as that of passage thickness from 6 to 58 μm were explored in the experiments because significant changes in the TBC microstructure could be expected.
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