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Figure 2 Schematic of processing for graphene.
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These graphene-sheets should facilitate the manipulation and processing of graphene based material for various applications.
Laser processing of graphene is of great interest for cutting, patterning and structural engineering purposes.
For applications in electronics, the reliability of processing of graphene is a major obstacle.
The laser interference processing of graphene oxide films is a mask-free, surfactant-free and large-area approach to the production of hierarchical graphene micro-nanostructures, and thus shows great potential for fabrication of future graphene-based microdevices.
The results can be important for the fabrication or chemical processing of graphene-based materials and devices.
The effects of the functionalization degree on the optical and transport properties of graphene are discussed with a twofold aim of (i) providing reproducible experimental protocols for tailoring graphene properties, and of (ii) providing insights into the chemical mechanisms involved in the plasma-processing of graphene with hydrogen and oxygen atoms.
The large area processing shown here will open opportunities for graphene in industrial settings.
As a comparison, the conventionally placed silicon substrates (faceup) were also used for graphene growth in the same processing conditions as that of the upside-down samples.
One of the latest is for graphene.
Current designs for graphene transistors were limited by irregularities and impurities in graphene sheets.
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