Your English writing platform
Discover LudwigExact(9)
However, a-SiC H films deposited a-SiC Her process pressures show degradation in their structural and its network properties.
Coatings with compositions ranging from near stoichiometric Al2O3 to aluminium rich aluminium oxide were produced using different oxygen process pressures.
Magnetron-plasma enhanced chemical vapour deposition (PECVD) is a process tool which allows the deposition of plasma polymer coatings at process pressures below 1 Pa.
With process pressures of ≤ 1 Pa this technology is well adapted to the sputtering process of optical interference coatings and also facilitates an inline-process implementation.
The metalorganic vapor-phase epitaxy (MOVPE) growth of GaN from TMGa and NH3 at higher process pressures up to near-atmospheric pressure in commercial production scale multi-wafer reactors is investigated.
The paper also deals with the development of group-III nitride growth processes at elevated process pressures, highlighting the effects of gas-phase nucleation phenomena on the growth efficiency of GaN.
Similar(51)
The process pressure was controlled at 20 mTorr.
The process pressure of ALD and MLD was 500 mTorr.
Process pressure affected chemical composition of Ti C:H films.
Also, the sheet resistance decreased with decreasing process pressure.
The process pressure sets again a boundary condition for the single components.
Write better and faster with AI suggestions while staying true to your unique style.
Since I tried Ludwig back in 2017, I have been constantly using it in both editing and translation. Ever since, I suggest it to my translators at ProSciEditing.

Justyna Jupowicz-Kozak
CEO of Professional Science Editing for Scientists @ prosciediting.com