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The catalytic current was especially studied as a function of the AuNP size and amount, and procedure for deposition.
Pure metal helices on a smooth surface without patterning are desired to be developed with a one-step procedure for deposition.
We have developed and optimized electrochemical procedure for deposition of the stable and uniformly distributed Ru and Ru−Pt nanoparticles onto n-type Si (n-Si) electrodes.
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The typical laboratory procedure for multimetal deposition is carried out in several steps.
We have identified a simple, reproducible procedure for the deposition of DNA on Zeonex-coated microscope slides.
In addition, the sequence of deposition procedure for the TiN/BON bilayers highly affected the hardness.
Cerium oxide (CeO2) thin films used liquid injection atomic layer deposition (ALD) for deposition and ALD procedures were run at substrate temperatures of 150°C, 200°C, 250°C, 300°C, and 350°C, respectively.
Aluminide and Al-containing coatings were synthesized on commercial ferritic (P91) and austenitic (304L) alloys via a laboratory chemical vapor deposition (CVD) procedure for rigorous control over coating composition, purity and microstructure.
Samples were subjected to the alignment procedure during deposition on the coverslip (SI-3) except for the data described in Figure S10e (serving as a control for alignment).
We have applied this procedure for deciphering gene-phenotype networks underlying fat deposition and muscularity in pigs.
Here, we performed a multistep procedure for inferring causal networks underlying carcass fat deposition and muscularity in pigs using multi-omics data obtained from an F2 Duroc x Pietrain resource pig population.
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