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Whereas introducing TMEDA last and immediately cooling the reaction mixture to −35 °C produced high yields of 2, performing all of the procedure at ambient temperature induced the precipitation of a different solid.
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All chromatographic procedures were performed at ambient temperature, and the corresponding peaks from the QTrap LCMS/MS analysis of both the 0.5 w/v MOLE and 0.5 w/w MOLM were identified by comparison with the literature/ACD labs mass spectral library.
The entire synthetic procedure was carried out at ambient pressure and low temperature (85 °C).
After the separation procedure, these silicon wafers were dried at ambient condition.
For completeness, enzymatic activities were measured in fluid solution at ambient temperatures with procedures described above (addition of Griess reagent, etc).
The polymerization process can be carried out at ambient temperature only for 5 min ultraviolet radiation, which is a low-energy procedure.
The O/W interfacial tension was measured at ambient temperature according to the procedure described by Wen et al. (2010).
The procedure is demonstrated with 3 mm NMR tubes at ambient and elevated temperatures but should be equally applicable to smaller diameter tubes.
The assays were conducted at ambient temperature (18 22°C) following the procedure described by the manufacturer.
In contrast, the high ductility of the present material suggests shaping by deep-drawing at ambient temperature, a considerably more convenient procedure.
Subsequently, the as-grown Sn2S3 thin films were subjected to a postannealing procedure at 400 °C for 40 min in ambient air.
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