Sentence examples for precursor flow from inspiring English sources

Factors, as substrate temperature, solution concentration, air pressure and precursor flow rate have been studied at two levels.

A statistically significant influence of substrate temperature and precursor flow rate has been found for film growth.

The deposition of Si-nanocrystals as a function of substrate temperature, precursor flow rate and total gas pressure was explored.

In this study, the substrate temperature, the precursor flow rate and the O2 flow rate were varied.

The resulting InN material exhibits an optical absorption edge that varies from 0.83 to 1.34 eV, strongly dependent upon the precursor flow ratios employed during growth.

It was found that with increasing carbon precursor flow (Methylsilane) the amount of substitutional carbon rises up to a critical value.

When the liquid polymer precursor flowing through is exposed to that 3-D image, it solidifies to form a corresponding 3-D plastic structure.

This is illustrated in Fig. 1. Figure 1 Laser pyrolysis illustration and the role of carrier gas and precursor relative flow-rates (a) when the precursor flow-rate is larger than the encapsulating carrier gas (Ar) and (b) when the precursor flow-rate is smaller than the flow-rate of Ar.

CH4 is taken as carbon precursor flowing over a 500-nm-thick Ni film catalyst on a SiO2 substrate.

The substrates were heated to 150 °C and passed underneath the precursor flows at a distance of approximately 60 μm and speed of 50 mm s−1.

Amorphous silicon (a-Si) optical films were deposited on a silicon substrate by ICP-PECVD at the temperature of 300 °C, using argon (Ar) and silane (SiH4) as gas precursors, with the influences of precursors' flow rate, RF power and operating vacuum pressure on the optical properties and microstructure evolutions of a-Si films as the object of our investigation in this study.