(a) 3D polymeric template as a starting structure, (b) sample post-baked at 400 °C for 1 h without pre-baking after precursor infiltration, and (c) the pre-baked template without precursor infiltration.
Unless his post-Bake Off career is as a trance DJ at the Berghain nightclub.
Judging by previous conetestants' post-Bake Off achievements, Nadiya could expect to earn a book deal from her triumph.
The pastes were deposited on indium tin oxide coated glass substrates followed by 300°C post-bake to remove residual solvents.
After soft baking, exposure with the first chrome mask which defined the channel widths (7 15 µm), and the post exposure bake, a second, much thicker, layer (150 µm) of SU-8 2075 photoresist (MicroChem, Newton, MA) was spin-coated on the first layer.
The pre-polymers have a sufficient number of reactive sites that can be activated for cross-linking by UV radiation, which takes place during a post-exposure bake that is executed at the same temperature as the other process steps.
The deprotection of 2-trimethylsilyl-2-propyl group of the polymer takes place in the exposed region after post-exposure bake.
The UV lithography process was finished by a post-exposure bake (95°C for 8 min) and a development step.
Afterwards, a photolithographic process is performed with an exposure energy of 120 mJ/cm2, and then a post-exposure bake is performed for 90 s at 100°C.
Temperature uniformity of a wafer during post-exposure bake (PEB) in lithography is an important factor in controlling critical dimension (CD) uniformity.
