We did additional PhyloGibbs-MP runs on the first 11 kb upstream of duf, specifying that all of this region is expected to be functional, and also specifying two possible widths of binding site motifs (9 bp and 12 bp).
The control limits on an XmR chart are dependent on the ordering of the data, and this dependency is such that the ambiguity in "expected variation" (as quantified by the range of possible widths of the control limits) is large when working with data that have no inherent natural order.
It allows us to predict the potential to trigger (or sustain, when L0= L0∗) a wave through a perturbation of any possible width and height, as well as the expected height that such a wave will reach while it travels, stalls, or stochastically fluctuates.
For each of the two possible widths (b_i), a fixed number of units can be placed behind the facing.
Because CentriMo tests sub-regions of all possible widths and placements in local enrichment mode, its time complexity increases to quadratic in sequence length compared, with linear time complexity in central enrichment mode.
Local heating is possible by reducing the width of the microheater at the heating point.
Furthermore, the possible influence of the width of intergranular films on the fracture mode is discussed.
By changing the time for selective etching of the photoresist, it is possible to change the width of the elements of the lithographic masks.
Second, only two values are possible for the visible width of a facing of item i, i.e., (b_i = l_i) for lengthwise and (b_i = w_i) for crosswise display orientation.
By changing the time of selective etching of photoresist, it is possible to change the width of the elements of lithographic masks and, accordingly, the width of opened intervals between the elements of the mask through which there is a further etching of the metal layer.
