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However, after much litigation, Fairchild Semiconductor was granted the patent on the planar process, the basic technique used by subsequent manufacturers.
Although Fairchild filed a patent application in 1959 for this planar process, it soon cross-licensed integrated circuit patents with coinventor Texas Instruments while the companies battled in the courts to a split decision 10 years later.
Noyce saw that the solution to the problem of connecting the components was to evaporate lines of conductive metal (the "wires") directly onto the silicon wafer's surface, a technique known as the planar process.
–Jean Hoerni, planar process for transistor and chip manufacture.
In addition, the fabrication technology of FinFETs is a quasi-planar process and more compatible with the conventional planar process than previous vertical double-gate devices.
10a, b Figure 2a displays a gripping element based on dielectric elastomers, 10b the element was fabricated using planar process steps only.
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The sensor components can be fabricated by using planar processes on a silicon substrate, making its manufacturing compatible to planar electronic fabrication technology.
Additionally, they have the advantage of low weight, low cost of mass production, small size and compatible with commercial planar processes for large-scale circuitry.
The photodiode samples employed in this paper are planar processed on high-resistivity n-type silicon substrate, resulting in a p+/n−/n+ diode structure.
Among other advantages, this technique permits the use of functionality-inducing planar processes on flat starting materials, which after shape-shifting, result in a unique combination of macro-scale geometry and surface topography.
Advantages of our diffractive-optical approach include: the feasibility of wavefront engineering by using elements other than binary-phase zone plates; the simplicity of the planar processes needed to manufacture large arrays of high-NA diffractive-optical elements; and the ease of wavelength scaling, with the promise of ultimately approaching the limits of the lithographic process.
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