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The pit diameter was 100 nm while the depth ~70 nm.
C. bifermentans induced more localized corrosion in CS with a pit diameter of 50 μm.
At lower temperatures, however, where pit formation is initiated solely at point defects, a narrow pit diameter distribution was observed.
The generalized extreme value distribution, such as Weibull, provides adequate statistical descriptions of the pit depth and pit diameter distributions.
The pit location, pit diameter and pit depth are examined to determine the influence of the pitting on the ultimate strength.
Results show the considerable influence on the probability of failure of pit diameter and the parameters describing the pitting corrosion model.
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For a given ratio of PMMA/PS the average pit diameters appear to increase linearly with the square of the film thickness, the gradient of which is dependent on the film composition.
The sample surface close to the stripe region has been patterned with a squared two-dimensional array of circular pits (diameter ~ 150 nm, depth ~ 25 nm, period ~ 1 μm) with an overall width of about 10 μm from the stripe edge, obtained by means of Electron Beam Lithography (EBL) and reactive Ion Etching (RIE).
The surface of MC coating is just a little rough (Figure 9(a)), while CE pits with diameter more than 30 μm can be observed clearly on the surface of CC coating as shown in Figures 9(b) and (c).
Increasing the exposure time to both air and oxygen plasma brought about quantitative rather than qualitative changes (increase in edge recession, growth of pits in diameter, depth and concentration).
Pits with diameter sizes of several micrometers were observed on the surface of composites after plasma sputtering, which indicate that one or several grains are sputtered out during the plasma sputtering process.
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