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Nevertheless, the emerging ripple patterns in this fluence range have very small amplitude and regularity, which are of little relevance for technical applications.
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Therefore, the estimated carrier injected density at this fluence in the NWs was approximately 0.57 × 1020 cm−3.
Below this fluence, the surface patterning was not observed but only roughness was visible on the surface of Ge(100) as observed in our previous experiment with medium-range energy ions.
At this fluence, only 1 in 1,000 atoms on the surface has undergone a collision with an incident ion.
Focused ion beam (FIB) implanted patterns in ta-C samples, obtained with a fluence of 5 × 1015 cm− 2, are also presented.
This fluence range is not accessible in our experimental setup.
Here, we should point out that around this fluence nonlinear effects such as exciton exciton annihilation were not observed in our experimental studies.
Here, we should point out that around this fluence non linear effects such as exciton exciton annihilation were not observed in our experimental studies.
This fluence yields a local intensity that reaches ~4 x 10 W/cm in the near-field where the field enhancement is calculated to be around 4.5 from the Mie theory.
Increasing the laser fluence - depending on this fluence, the spatial intensity distribution, and the SiO x film thickness - the film softens, stretches, tears, and resolidifies in a well-controlled way so that a regular meshwork or grid pattern is formed.
After this fluence the SBH remains almost constant up to a fluence of 1×1013 ions cm−2.
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