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Four coordination patterns are defined for workflow integration.
The Test Patterns are defined in a catalogue that can be reused for testing other applications.
And 160 nm wire patterns are defined by using KrF lithography technique.
Risk patterns are defined by a statistical metric, relative risk, which has been widely used in epidemiological research.
Note that the patterns are defined using a database which is different from the one used in the evaluation.
At this scale, five elementary fatigue damage patterns are defined, three correspond to external macroscopic cracks and two correspond to internal macroscopic cracks.
Similar(28)
Furthermore, three different patterns were defined by PFGE.
CTLM patterns were defined on substrate by using a standard photolithographic technique before grown.
Different daily usage profiles (five use patterns were defined), and zoning of sleeping and living areas are presented.
A template for specifying modeling patterns is defined and, as an example, the Control Component Pattern (CCP) is proposed.
The patterns were defined by standard photolithography and dry etching with chloride-based plasma by reactive ion etching.
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