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Graphene electrical electrodes were patterned using photolithography techniques.

Third, the deposited metal layers were patterned using photolithography.

A resist layer, spun on the substrate, was patterned using photolithography with a customized optical mask.

The resonators and the SQUID loop are patterned using optical lithography and reactive ion etching.

Different via sizes from 0.6 × 0.6-8 × 8 μm2 were patterned using standard lithography.

CNT thin films are readily patterned using a variety of techniques.

To create the anchor and the dimple holes, polyimide is patterned using RIE.

Tensile specimens, 100 microns long and 10 microns wide, were patterned using photolithography.

G1 is patterned using a negative photoresist mold by photolithography process.

For the connection to electronics, aluminum contacts were patterned using a lift-off process.

The sites were patterned using the self-organizing map (SOM) based on fish biomass data.

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