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The garment pattern design process is a mapping between the three-dimensional garment surface and the garment flat pattern.
The lost-pattern process is used for the production by sand molding of single casts in metal.
Caused by unique properties of organic-inorganic hybrid perovskite films, the patterning process is very challenging.
This laser-assisted deposited copper patterns process is a photothermal reaction in which the copper ions (Cu2+) oxidized from the substrate surface by T.f.
This patterning process is called self-avoidance.
One important prerequisite for a two-photon induced patterning process is a sufficient TPA efficiency, i.e. a high TPA cross section of the used photoinitator, which mainly depends on the delocalized p-electron system of the photoinitiator (Pucher et al. 2009).
Only when the patterning process was optimized, high-quality hole-patterned masks of different dimensions and geometry were obtained.
A resist-assisted patterning process was used to produce a cathode assembly consisting of a gate and focusing electrode.
For the solar module, the fabricating process was similar to that of small solar cells; the laser scribing patterning process was consistent with that reported previously [25].
As an engineering application of the liquid cluster ion beam process, the etching and patterning process were performed on the Si surfaces using metal masks.
Surface patterning process was monitored by atomic force microscopy, showing differences in surface roughness caused by different molecules being attached to the surface.
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