Observers report a non-rigid distortion of the pattern, including: (i) an expansion in a direction perpendicular to the stripes, and (ii) a perceived curvature of the stripes.
Patterns included: (i) a preference trade-off counterbalancing approach and avoidance, (ii) a value function linking preference intensity to uncertainty about preference, and (iii) a saturation function linking preference intensity to its standard deviation, thereby setting limits to both.
Therefore, the four geometric patterns included: (i) normal geometry with LVMI and RWT <95th percentile, (ii) concentric remodeling with LVMI <95th percentile but RWT ≥95th percentile, (iii) eccentric hypertrophy with LVMI ≥95th percentile but RWT <95th percentile and (iv) concentric hypertrophy with LVMI and RWT ≥95th percentile.
Although our knowledge of genome sizes in ferns is limited (< 1% of species have been analysed), available data suggest that patterns of genome size evolution, which include (i) polyploidisation; (ii) paleopolyploidsation; and, (iii) changes in chromosome size, are not operating uniformly across all fern lineages [ 6- 10].
The three different flow patterns of liquid including (i) liquid flow in series (L-IS), (ii) liquid flow in series with splitting (L-ISS) and (iii) liquid flow in series with recycle (L-ISR) are compared.
The positions of non-zeros in the i-th row in T-1 (sparsity pattern) includes any position of the i-th row that is listed in c(i ).
The most common multidrug resistance (i.e., >2 drugs) pattern included ciprofloxacin, nalidixic acid, and tetracycline.
Based on the expression patterns, profiles were classified into two categories: those with an up-regulated pattern, including profile b, d, e, f and k, assigned with 1,189, 1,265, 775, 650, and 323 probe sets, respectively; and those with a down-regulated pattern, including profile a, c, g, h, i, and j assigned with 1,773, 1,149, 650, 541, 371, and 396 probe sets, respectively.
The characteristics, tested in conjunction with specially designed test patterns (i.e., TG18 patterns), include reflection, geometric distortion, luminance, the spatial and angular dependencies of luminance, resolution, noise, glare, chromaticity, and display artifacts.
Other patterns include exaggerated paisleys, ovals, numbers and letters.
