Sentence examples for pattern height from inspiring English sources

The deoxygenation caused by the secondary process of back-scattered electrons leads to a shrinkage of pattern height.

The total pattern height measured by AFM was ∼ 350 nm after the two-step plasma etching.

In addition, the effects of embossed pattern height on the phase-shift mask phenomenon were investigated.

As shown in the AFM image of Fig. 1c, the transferred PDMS layer shows good pattern fidelity and structural integrity, with a pattern height of ~100 nm (i).

For the 600 μm-diameter patterns, measured pattern width ranged between 541-972 μm whereas the pattern height ranged between 613 1,196 μm.

The phase-shift mask of light was represented by φ = 2πΔnh/λ, where λ is the light wavelength, 325 nm, Δn is the refractive index difference, 0.63, between air and the phase-shift masking material (PR, refractive index: 1.63), and h is embossed pattern height.

Figure 2 TEM image, electron diffraction pattern, height-position information, and schematic plot.

The pitches of grating patterns are 555 and 277 nm with pattern heights of 40 and 25 nm, respectively.

Measured average pattern heights of the 600, 400, 200 μm patterns were 938, 666, 312 μm, and average pattern widths were 815, 582, 259 μm, respectively.

The pattern heights measured by AFM are in the range of 25-28 nm that is close to the original film thickness.

We assessed the biomass production, biomass allocation patterns, height growth, and root airspace of seventeen wetland plant taxa, including two potentially invasive species, grown under high nutrient conditions and subjected to four hydrologic regimes: constant drawdown, cyclic flooding and drawdown, cyclic flooding and drought, and constant flooding for the duration of the experiment (∼10 weeks).