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The higher robustness to deformation and better resistance to etching of the SiC membranes allow for a wider choice of the deposited materials, leading themselves to a more precise pattern duplication and less complicated resistless dry etching applications.
NI lithography may be limited due to overlay, defects, and template wear because it is based on direct contact and one-to-one pattern duplication; however, solar cell applications have a high tolerance for pattern uniformity and overlay accuracy.
In the first stage, the Si master is placed on the Al substrate under a pressure of 1.3 MPa, and the system is heated to 300°C in 20 min. In the second stage, the pressure applied on the master first increases to 4 MPa rapidly and then maintains for 40 min, which enables the pattern duplication from the Si master into the Al substrate.
We found that Asx mutation led to the formation of dual-lobed wings at a low frequency (Figure 2E), suggesting that a pattern duplication may have occurred.
For example, mutation of PcG member polyhomeotic (ph) in the anterior compartment of the wing results in ectopic expression of en, which leads to formation of multiple A-P boundaries and therefore pattern duplication [31].
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En induces a cascade of events that patterns the entire A-P axis, and ectopic En expression in the anterior compartment of the wing leads to pattern duplications.
A small number of wings bearing Asxxen mutant clones exhibited dual-lobes (5.0%, Figure 2E, 5C), a phenotype that is correlated with pattern duplications.
These different configurations are likely to represent different mutational events: translocation events will produce signatures consistent with the dispersed pattern, duplications and deletions with the standard pattern, tandem duplications with the wrong order pattern, and inversions with the reverse complement pattern (supplementary fig. 1, Supplementary Material online).
This pattern of duplication might be resulted from part of the two rounds of genome duplication in vertebrate ancestry [ 6].
The tetraspanin UPKs show a clear pattern of duplication in the common ancestor of vertebrates more than likely commensurate with the major genome duplication event that has been hypothesized in this ancestor [ 34].
This pattern of duplication is often called 'duplication shadowing' [ 33] as the duplicated sequences tend to cluster in the region along with an ancestral copy.
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