The following are some of the lessons learned from Sprint 2. Fig. 4 Activities performed for the development of artifacts in Sprint 2. In Sprint 2, there were 15 documents that reported the lessons learned that were coded using the PABC-Pattern approach, with a total of 7 documents related to the development of artifacts.
For practically all values of ℓ, the multiple-pattern approach with the JS distance led to better results than the single-pattern approach with the same pattern length ℓ.
As with the real-world protein sequence sets, the multiple-pattern approach with varying pattern lengths gave the best results.
For values ℓ < 19, the multiple-pattern approach with the Euclidean distance performed worse than with the JS distance and even worse than the single-pattern approach.
Our spatial pattern approach, combined with the use of a pindot, allows the selective removal of this specular reflection, resulting in high contrast and no diffuse illumination regions generated by the fraction of light with no phase modulation.
As an El Niño weather pattern approaches, and with it the likelihood of another drought, the bitter divisions of water politics are re-emerging – and with them the threat of ecological devastation, the desperation of farm communities and South Australia's deep-seated fears about water supply.
The 12-fold photonic quasi-crystal (PQC) pattern was chosen as top and sidewall pattern owing to its capability to better enhance surface emission comparing with 2D PhC pattern approach [22].
GEM-TREND was developed to retrieve gene expression data by comparing the gene-expression pattern of queries with those of gene expression data in a public database based on the nonparametric, rank-based pattern matching approach with the additional calculation of statistical significance and to provide network visualization.
We propose a prediction technique that combines a workload pattern mining approach with a traditional collaborative filtering solution to meet the accuracy and efficiency requirements.
The possibility of increased resolution provided by the UV-vis TSA technique can indeed offer a very interesting alternative to the extremely challenging and costly extreme UV (XUV or EUV) lithography or multiple deep-UV patterning approaches to comply with Moore's Law.
We developed a simple patterning approach where a grid with micrometer rule is used in order to control the deposition of a solute.
