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Here, we leverage large-scale exome-sequencing data to create an empirically based simulation framework to evaluate the impact of key parameters (background variation rates, locus heterogeneity, mode of inheritance, penetrance) on power in gene-based burden tests in the context of monogenic disorders.
Of all investigated parameters, background clinical characteristics of patients (such as those incorporated in the FINDRISC score) were most strongly associated with the future development of DM or disturbed glucose metabolism.
An executable version of MDscan (Liu et al., 2002) was used with the following parameters: background model: S. cerevisiae intergenic; motif width: 6 15; number of top sequences to look for candidate motifs: 30; number of candidate motifs for scanning the rest sequences: 20; number of motifs to report: 5.
We extracted the following data from the included studies: the number of Categories 1 and 3 smears, the average score (mean ± SD) of each of the five objective parameters (background blood or clot, amount of cellular material, degree of cellular degeneration, degree of cellular trauma, and retention of appropriate architecture), and the average total score of the five parameters (mean ± SD).
Sensitivity coefficients to model parameters (background input, kf, occupational exposure, and the assumed TCDD concentration at hire) allow for a convenient recalculation of the serum TCDD curve and of the derived exposure indices for different assumed values of the model parameters.
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In order to overcome parameter background modeling methods, nonparametric background modeling techniques have been developed for estimating background probabilities.
The RMAExpress V1.05 software package (http://rmaexpress.bmbolstad.com) [ 16] was used to generate probe level intensities by setting the operating parameters as: Background adjust: Yes; Normalization: Quantile; Summarization method: Probe level model.
For calculation of Gaussian model parameters, pixel background in the previous frame is required.
With these parameters, the background probability distribution relative to node 3 (eruption) is completely defined by a beta distribution with parameters α=0.
Different PLD process parameters – including background gas pressure and the number of laser shots as well as post-deposition annealing treatments – have been varied to control the growth of Au NPs and films, thus tuning the surface plasmon characteristics.
All samples were defined by two parameters: genetic background and light treatment.
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