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Since binding sites are usually short, sometimes degenerate, and often independent of orientation, alignment algorithms may not align them correctly.
Micro- and nano-topographies of scaffold surfaces play a pivotal role in tissue engineering applications, influencing cell behavior such as adhesion, orientation, alignment, morphology and proliferation.
The orientation stage requirements are distinct from those used in photolithography since the depth of focus of projection optics allows for larger errors in the orientation alignment.
Manipulation of molecular orientation alignment in MCTLCPs (main-chain thermotropic liquid crystalline polymers) by pure shear at nano scale has been investigated for the first time using molecular dynamics (MD) simulation.
These methods show great potential in organization of nanowires with controlled orientation, alignment density, and spatial position onto various device substrates, which are ultimately necessary for fabrication of future-generation electronics, optoelectronics, sensors, bioelectronic interfaces, and energy conversion and storage systems.
Within the impact approximation, collisional line broadening parameters and depolarizing and polarization transfer (population, orientation, alignment transfer) rates are complementary: both include the effect of collisional transitions between the Zeeman sublevels of a given level, or between fine or hyperfine structure levels of a given term.
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When reverse orientation alignments were observed, both the original contigs and public database sequences were included.
Only same orientation alignments with sequence identity ≥ 95% over at least 100 bp (80 bp for singlets) and with <5 mismatches at their 3' extremity were considered.
Only same orientation alignments with sequence identity ≥ 95% and <26 mismatches at the 5' extremity and <5 mismatches at the 3' extremity of the query sequence were considered.
In order to align the subsequent mask precisely along the crystal orientation, an alignment accessory pattern consisting of a series of circular opening is fabricated on an arc of radius R with centre on the opposite side of the wafer where another circle is fabricated as shown in Fig. 14.
Loesch, H. J. Orientation and alignment in reactive beam collisions: recent progress.
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