Sentence examples for opportunity of using the from inspiring English sources

Critics accuse Opportunity of using the disputes to try to force Telecom Italia to sell its stake in Brasil Telecom.

As the right to vote spread wider, the opportunity of using the press to sway opinion and thus dictate the course of events grew with it.

Equal opportunity of using the best relay is the fairground to build up this scheme.

This illustration shows the further opportunity of using the data acquired by the present device.

Nelson Mattos practically said 'we'll launch more local Google products' when he said: "I am excited about the opportunity of using the great brains we have here to develop product in the region not just for EMEA but the rest of the world too".

The city's political class have leapt at the opportunity of using the Games to revitalise Glasgow's East End, but even in an area with some of the worst levels of multiple deprivation anywhere in the UK – a place crying out for investment – they've failed to convince many of the residents that their experience of the Games legacy will be a positive one.

In order to efficiently solve the problems created by the deepening energy crisis affecting Europe and the world, governments cannot neglect the opportunities of using the energy produced by sun collectors.

This study is expected to feed the information channel for the scientific, political and other concerned communities to consider possible opportunities of using the river as source of water supply for the city thus contribute to strategic interventions in the coastal urban regions planned by the Bangladesh Delta Plan (BDP).

Furthermore, we present the advantages and opportunities of using the Patient-Reported Outcomes in drug development, as seen by a pharmaceutical company.

We attempted to collect information on all aspects of the opportunity cost of using the service covering both direct out of pocket costs (transport fares, supplies) and indirect costs (time travelling to and waiting at the facility).

The opportunity of using these parameters for end-point detection of etching and plasma cleaning is discussed.