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Despite the ideally ordered patterns obtained, this method is limited by the pattern transfer protocol, and pattern transferred by imprint lithography directly onto metallic substrates such as Al foils or Al films requires 50-2000 times higher pressures in comparison with imprint lithography on polymer layers [11].
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In all cases, the solutions obtained using this method are superior to those obtained from other methods.
It has been demonstrated that values obtained using this method are similar to those obtained under direct anaesthesia [45].
This indicates that the accuracy of the DNA histogram obtained by this method is equivalent to that obtained by flow cytometric analysis.
Results obtained using this method correlate very well with those obtained with the traditional terminal restriction fragment length (TRFL) by Southern blot technique [12].
High efficiencies are obtained with this method.
The following result was also obtained by this method.
We show some residual stress profile obtained by this method.
Some new supersaturated designs are obtained by this method.
Foamed parts obtained by this method have a surface skin.
Reproducible submicron features could also be obtained using this method.
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