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The spin-coating process was repeated several times to obtain a thickness of ~100 nm.
In order to obtain a thickness in the 2 nm region a new process technology is needed.
Using spectroscopic ellipsometry measurements in the 200 to 800 nm wavelengths domain, we obtain a thickness of the TiO2 film in the range of 70 to 80nmm.
Samples were polished on both sides to obtain a thickness of 100 to 180 μm for wall rock samples and 40 to 70 μm for mylonite samples (Table 1).
To obtain a thickness map of the TiO2 layer, optical measurements (TT and TR) were taken after the TiO2 spray and prior to the Cu O deposition.
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Using 100 mM HNO3 as the electrolyte was the most advantageous condition to obtain a thick oxide layer (thickness ~ 180 nm), whereas, the thickness abruptly decreased for concentrations of HNO3 above or below 100 mM.
The modified layer, which is composed of bright layer and transition layer, obtained a thickness of 70 μm at 670 °C, 3 h.
This process is repeated three or four times to obtain a film thickness around 100 nm.
Gold was evaporated to obtain a gold thickness of 4 nm.
Two trenches are milled on either side of the tungsten that has been deposited above the area of interest in order to obtain a final thickness of the membrane between 50 and 100 nm.
Chicken breasts purchased in a grocery store were cut parallel to the natural surface to obtain a uniform thickness of about 10 mm.
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