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The given values refer to nominally deposited layer thickness.
For the film thickness larger than 4 ML, a crystalline film grows, and the thickness determined from the fringes on the CTRs agrees with the nominally deposited film thickness.
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For the InAs QDs layers, we deposited nominally 2.3 monolayers, which correspond to 0.69 nm thick.
In direct comparison to Fig. 2b, nanorods deposited to nominally 50 nm in length, Fig. 2c, are sparse and individual.
In this paper we describe the surface characterization of Cu deposited onto nominally-flat and roughened hydrogen-terminated Si 001) surfaces in ultra-high vacuum using scanning tunneling microscopy.
By depositing nominally similar DLC films on silicon samples positioned horizontally and vertically on the reactor cathode plate it was possible to examine the variations in the coating characteristics and mechanical properties that occur due to the geometry of the substrate being coated.
A nominally 0.5 nm thick Au film was first deposited by thermal evaporation on the InAs wafer in a separate evaporator chamber and then samples were transferred to the CBE system.
Both preparation methods are described below: R1: preparation of Pt Janus micromotors under nominally normal incidence: 80 nm of SiO2 was deposited by an e-beam evaporator at 0° (normal incidence) as the first layer onto the silica beads followed by 7 nm of titanium (Ti) and 20 nm of Pt (Fig. 1a).
The deposited layer has a thickness of only nominally 50 nm, containing the Organic Metal (conductive polymer), polyaniline, and silver.
Here CNT solutions are deposited at the macro-scale and form highly disordered, nominally planar, spaghetti-like networks with but a few individual CNTs standing upright, at many unregistered angles relative to one another.
Nominally pure ZnO, Al-doped n-type ZnO (ZnO Al), and N-doped p-type ZnO (ZnO N) thin films, as well as Zn1−xCdxO and Zn1−yMgyO alloy films, have been deposited by this mist-CVD system.
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