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These constitutive laws are implemented in a numerical model developed based on the moment-rotation approach for determining the positive and negative resisting bending moment of the slab's unit width cross section.
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irradiation and were assessed as potential negative resist materials.
(c) A BPD-Ni system was employed as a negative resist for e-beam lithography.
Unfortunately, there is no negative resist that gains similar popularity as PMMA and ZEP520.
However, we found no evident improvement for polystyrene (negative) resist development at an elevated temperature of 50°C.
It would find applications where negative resist is prefered and exposure time is not a major concern.
With a low sensitivity, it would find applications where negative resist is desired and throughput is not a major concern.
The NHA can be fabricated either using a simple liftoff process with negative resist or double liftoff process with positive resist (see the "Methods" section).
SU8 is a negative resist which is widely used for the fabrication of micron scale lateral features over a wide range of heights using photolithographic methods.
Besides PMMA residues, our laser cleaning is also effective for other polymer residues, such as novolak-based negative resist (AR-N 7520).
The graphene films were now patterned using optical lithography with negative resist followed by ICP plasma etch on an Oxford Instruments Plasmalab 200 in Ar/O2 atmosphere.
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