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In addition, when a negative voltage is applied to a virgin oxide-based ECM device, which is called negative forming (N-Forming) process, an oxygen vacancy CF can also be formed to bridge the electrodes [16, 17].
Negative forming.
A negative forming voltage, which determines the conducting filament size, is reduced from 2.6 to 1.1 V with a 100-ns pulse width.
However, a conventional negative forming voltage (-2.6 V) is shown in blue line, this changes HRS (approximately 15 MΩ) to LRS (approximately 10 kΩ).
Conversely, with a negative forming voltage on the top electrode, oxygen gas forms under the underlying HfO2 layer and above Pt the bottom electrode (Fig. 8e).
The negative forming voltage (Vform) is -6.4 V to initiate the resistive switching with a current compliance (CC) of 100 μA.
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