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The effects of yttrium addition and multilayer interface on structure, high-temperature oxidation and corrosion behaviors of the coatings were investigated.
Enhancement in adhesive strength by ion implantation of mixed carbon and silicon was ascribed to the formation of the multilayer interface consisting of mixed carbon and silicon ion implanted layer and the amorphous layer of carbon and silicon.
Calculations based on a binary collision model predict an ion-assisted growth window for optimized Cr/Sc multilayer interface sharpness, within the ion energy range of 21 eV to 37 eV and an ion flux of ∼ 10 ions per deposited atom.
This multilayer interface scaffold was reported to be loaded with different cells (fibroblast, chondrocyte, and osteoblast) for reconstructing insertion.
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We begin with a review of the proposed inelastic multilayer flexibility-based finite element with multilayer interfaces.
When the incident electric field is perpendicular to the multilayer interfaces, it produces a net interface charge due to the discontinuity in permittivity at the interface.
In order to analyze the microstructure of these hybrid multilayer interfaces, cross-sectional samples for transmission electron microscope (TEM) were prepared using conventional mechanical polishing and dimpling techniques.
The ability to produce stable delamination of thin film multilayer interfaces is a powerful tool for studying the interfacial adhesion within microsystems.
By extracting low-energy ions, with energies, Eion, ranging from 9 to 113 eV and with ion-to-metal flux ratios, Φ, between 0.76 and 23.1, from the sputtering plasma to the growing film, the nano-structure of the multilayer interfaces could be modified.
The angle 'θ' is measured between the normal to the multilayer planar interface and the direction of the incident beam at the prism.
The dips correspond to the Bloch surface modes propagating at the multilayer-air interface.
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