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Multilayer formation is avoided by the presence of the bulky triisopropylsilyl (TIPS) protected ethynyl group.
Multilayer formation is a potential explanation for the high Csat value of GLA, which exceeded the maximum ligand concentration that fit into one surface layer.
The multilayer formation is further confirmed by comparing the height of an individual cell (~560 nm, Additional file 1: Figure S3) to the Sz value (1168 nm) of the AFM image (Figure 4b).
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According to the low changes in the dissipation coefficient a rigid layer was formed and multilayer formation was not detected for two hours.
Cobalt/copper multilayer formation was analysed over different substrates in order to control the bilayer thickness and quality of coatings.
The physicochemical properties of the films were evaluated and the multilayer formation was monitored with microgravimetry measurements using a quartz microbalance crystal and an electrochemical technique.
The order of the multilayer formation was explored by comparing a modified electrode where [Zn II TRP]4+ was the outermost layer with an electrode where [SiW12O40]4− was the outer layer.
This is in agreement with the IRAS data, for which multilayer formation was observed to vanish between 173 and 223 K. Above 210 K, desorption is indicated by the continuous increase in the signal at 207 amu.
Multilayer graphene formation is confirmed with Raman and X-ray photoelectron spectroscopies, and the morphology of the processed GO sample is evaluated with scanning electron microscopy.
PLL/HA multilayer film formation was assessed by using fluorescence microscopy, contact angle measurements, cationic dye loading and confocal microscopy.
Polyelectrolyte multilayer (PEM) formation was based primarily on ion pairing and on additional intrinsic cross-linking through imine bond formation with Col I replacing native by oxidized HA (oHA) or CS (oCS).
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