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However, when τB becomes too much high τeff = τNéel and only Néel relaxation contributes to the heat dissipation mechanism.
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The PSS thin film passivation yields a high τeff of 9.4 ms on a high-resistivity Si wafer.
Second, the photosensitivity is much high.
High salaries got much, much higher.
It turned out that Vm did not obey an OU-process (Figure S4) and these estimates of τeff were systematically much higher than eRT and eSIT.
(Much higher).
Production was much higher.
How much higher?
They were much higher.
But it could be higher — much higher.
The risk level is much, much higher.
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