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Microstructures with minimum line width as small as 20 μm are demonstrated.
In this paper, we demonstrate that continuous, conductive grid lines with a minimum line width of 58μm can be processed on the top of the PEDOT PSS layer.
The HWHM was fixed to 0.122 mm/s, as determined from the minimum line width of the calibration foil, measured at 295 K.
Nanoimprint technology not only can reuse the templates but also can produce complex nanostructures with a minimum line width up to 5 nm [23].
Ag electrodes and wires were patterned using a shadow mask with a minimum line width of 100 μm using the same hardware to ensure process comparability.
The typical specifications for the minimum line width and channel length were 2 μm and 5 μm for photolithography and 25 μm and 20 μm for coarse printing techniques, respectively.
Similar(48)
The major differences between the two fabrication specifications are the minimum source/drain line width and the transistor channel length.
The highest spectral emission quality is observed for 150 s of irradiation as the PL intensity is most efficient with a minimum spectral line width.
In this study, a systematic method for optimizing multi-objective process parameters of fiber laser system was proposed to achieve excellent quality characteristics, such as the minimum scribing line width, the flattest trough bottom, and the least processing edge surface bumps for increasing incident light absorption of thin film solar cell.
The minimum experimental line width was 0.24 mm/s (full width at half-height).
The minimum experimental line width was 0.24 mm·s−1 (full width at half-height).
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