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In present paper, we construct a novel water treatment system based on microwave plasma technique and TiO2 photocatalytic technique.
TiN thin films were fabricated on Si (100) substrates using Electron Cyclotron Resonance (ECR) microwave plasma technique.
The aim of this work is to explain the electrochemical behavior of tin-based hydrocarbon nanoparticulate composite electrodes, synthesized by means of a microwave plasma technique without any binder or slurry process.
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Diamond-like carbon (DLC) films deposited by the microwave plasma CVD technique under varying bias voltages are investigated using atomic force microscopy (AFM) and spectroscopic ellipsometry.
Deposition of BDD is performed using a microwave plasma enhanced chemical vapor technique.
Here we demonstrate controlled synthesis of spatially isolated high quality micro- and nano-diamonds using a microwave plasma chemical vapor deposition technique (MPCVD).
Dense Si3N4 ceramics processed by pressureless sintering were diamond coated by microwave plasma chemical vapour deposition technique during 2 and 6 h, leading to different diamond grain size and nominal surface roughness.
An innovation is reported in the synthesis of a hybrid carbon structure resulting from the simultaneous growth of graphene and nanocrystalline diamond (NCD) by the microwave plasma chemical vapor deposition technique.
High rate deposition processes for hydrogenated diamond-like carbon films (a-C H) were developed using microwa-C Hlasma enhanced CVD (PECVD) techniques.
The carbon nitride films have been prepared on Si substrates using microwave plasma chemical vapor deposition (MPCVD) technique.
Diamond films with 70 mm in diameter were deposited on silicon substrates with Ar/CH4/H2 gas mixture, using microwave plasma chemical vapor deposition (MPCVD) technique.
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