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The effects of deposition conditions on film phase, microstructure, and deposition rate were investigated.
A 1.5 kW diode laser is used to build multiple layer parts, which are compared and analysed in terms of surface finish, microstructure and deposition efficiency.
The connection between film microstructure and deposition conditions has been studied extensively for a variety of hydrocarbon precursors.
Experimental results show that the phase composition has to be balanced with other coating characteristics like microstructure and deposition rate.
The effects of different deposition parameters, including flow rate ratios of GeH4 CH4 precursors, RF power and deposition pressure, on the microstructure and deposition rate were investigated.
Effects of laser power (PL) and pre-heating temperature (Tpre) on the composition, microstructure and deposition rate of TiNx films were investigated.
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This study demonstrates the growth of Na-β-alumina films by laser chemical vapor deposition and investigates the effects of deposition temperature (Tdep), molar ratio of Na/Al (RNa/Al) and total pressure (Ptot) on the phase formation, microstructure, orientations and deposition rate (Rdep) of the film.
This requires information about the mechanisms of growth and the connection between the microstructure and the deposition parameters.
Distributions of chemical elements in the coating/substrate system and microstructure after deposition and after heat treatment are shown.
Except for commonly observed bias induced densification in microstructure and decrease in deposition rate, strong preferential sputtering effect at high bias was observed.
In this study, the influence of the plasma spray process on the microstructure of the coating and deposition efficiency was investigated with the aim of achieving better knowledge and control of the process.
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