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scanning probe microscopy lithography.
Recently, scanning probe microscopy lithography (SPML) has attracted much attention because of its atomic resolution, simplicity, and low cost [5 10].
Long range, high precision, XY stages have a multitude of applications in scanning probe microscopy, lithography, micro-AM, wafer inspection and other fields.
Techniques such as electron beam lithography (EBL) and atomic force microscopy lithography (AFML) have proven successful in transferring nano-patterns with line width of the order of few tenths of nanometers.
In order to form micro- to nano-sized patterns, various lithographic technologies have been used, such as DUV photolithography [1], e-beam lithography [2, 3], X-ray lithography [4, 5], laser holographic lithography [6], nanosphere lithography [7], scanning probe microscopy lithography [8], and so on.
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We are developing multi electron beam columns for electron microscopy and lithography.
This nanostructured optical microfiber tip has the potential for applications in optical recording, scanning near-field optical microscopy and lithography.
Well-controlled nanostructure of polymer brushes has been fabricated by combining atomic force microscopy (AFM), lithography and surface-initiated polymerization techniques.
Electron beams are extensively used in lithography, microscopy, material studies and electronic chip inspection.
An Atomic force microscopy (AFM) based lithography system is successfully designed and constructed for automated patterning through local anodic oxidation.
Perovskites have also attracted considerable attention as nonlinear semiconductor absorbers for optical limiting [47], ultrafast optical signal characterization [48], microscopy [49], and lithography [50].
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