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The thicknesses of Mg layers were monitored by alpha-step.
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During the drying processes, the Mg layer was oxidized.
In this paper, an evaporated Mg layer is used to reduce series resistance of c-Si solar cells.
Surface termination with 50% of Mg layer was mainly considered because this was found to be the most stable (1 0 0) surface of MgAl2O4. Figure 1 shows the XRD pattern for Ti-doped MgAl2O4 nano phosphors with TEM graphs.
In the compositional analysis of EDS, an N and Mg layer was observed on the surface of the rhBMP2/d-BCP but not on that of d-BCP itself).
The results showed that at the first ARB cycle, Mg and Ti layers were necked and fractured, respectively.
In the same way the additional PASA and PAA (0.2 mg ml−1 in buffer 2) protective layers were adsorbed.
The cathode catalyst layers were fabricated using various amounts of Pt (0.5 mg cm−2, 1.0 mg cm−2, 2.0 mg cm−2, and 3.0 mg cm−2).
The organic layers were combined and evaporated in vacuo to afford 9 (280 mg, 64%%).
Mg and fluorocarbon layers are then deposited sequentially by thermal evaporation and sputtering, respectively.
The optimized thickness of the Mg metal layer is extracted from the following formula: Figure 4 Dependence of reflectance on the Mg thickness and oxidation steps.
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