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These techniques have been put forward as alternative methods for patterning conducting circuits due to the short manufacturing time, low cost, large-area patternability, and environmental friendliness compared to conventional photolithography [10].
The development of new methods for patterning the surface of parylene films is likely to lead to attractive new applications not only in the laboratory, but also for industrial products.
Compared to many other methods for patterning metallic hard mask structures, such as the popular lift-off method, our approach involves only spin coating and thermal annealing, thus is more cost-efficient.
In contrast to existing topology optimization methods for patterning plate structures, the goal of the proposed approach is to generate large deformations via eigenstrains, rather than to increase the stiffness of plate via reinforcement patterns.
Moreover, UV-NIL using soft polydimethylsiloxane (PDMS) mold has advantages over conventional methods for patterning of imprinted area, surface roughness, and curvature of substrate [17].
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This new strategy provides an alternative and promising method for patterning curved polymer surfaces.
A novel method for patterning cellular co-cultures that uses the layer-by-layer deposition of ionic biopolymers is described.
This paper presents a simple and low-cost method for patterning poly(dimethylsiloxane) (PDMS) barriers in porous support such as paper for the construction of flexible microfluidic paper-based analytical devices (μPADs).
Here, we present a method for patterning proteins and cells on poly(lactic acid) (PLA) and poly(lactide-co-glycolide) (PLGA) substrates that are routinely used as scaffolds in engineering tissues.
This opened the development of a new nanografting method for patterning SAMs with nanometer precision [10].
Recently, a solution method for patterning the ZnO nanorods using the self-assembled monolayer (SAM) template was reported.
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