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During the second stage the defined methodology was applied to remove the dark deposit which covered all the sculpture surfaces.
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PBS was applied to remove the unattached cells.
It was investigated that a new dry cleaning methodology named laser shock cleaning could be applied to remove the particles from the wafer surface.
Commonly, chemical treatment is applied to remove the hard scale.
TURBO DNase (Ambion) was applied to remove genomic DNA.
HPLC was applied to remove salts and excess MPAA.
Low-complexity filters were applied to remove highly repetitive sequences.
Ion exchange chromatographies were applied to remove impurities.
Large gaps and hyper variable sites were removed from the alignments; the same methodology was applied to gaps at the beginning and end of the alignment, which represent missing sequence data.
The GeneTS methodology was applied to the data to determine periodicity [38].
A content analysis methodology was applied to the transcribed interviews.
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